Apr. 1986 |
Established OPTNICS PRECISION Co.,Ltd. |
Mar. 1989 |
Developed Magnetic Thin Film Spacer |
Jan. 1993 |
Developed High Tension Mesh |
Oct. 1994 |
Developed Water Repellent Treatment Technique |
May. 1995 |
Set up Department of Technology Planning |
Jul. 1995 |
Developed High Aspect Mesh |
Feb. 1996 |
Developed Fabrication Process for Thickfilm Circuit |
Mar. 1996 |
Completed New Building and transferred Head Factory |
May. 1996 |
Established R&D Center |
May. 1996 |
Developed Diamond Composit Process |
Jul. 1996 |
Certified by Goverment with Innovation Act |
Oct. 1998 |
Micro Mold Set was Approved by NEDO (New Energy Development Organization) |
Apr. 1999 |
Developed X-ray Lithography and X-ray Masks |
Apr. 1999 |
Signed Joint Reseach Agreement with Karls Ruhe Nuclear Institute GmbH |
Jan. 2000 |
Developed Manufacturing Process for Micro-Probe |
May. 2000 |
Obtained Patent on Battery Rupture Disk |
jan. 2001 |
Developed Manufacturing Process for Fuel Injection Nozzle |
May. 2002 |
Received JAPAN Plastic Manufacturing Society Award |
Jul. 2002 |
Developed Vaporization Shadow Mask for Organic EL Display |
Oct. 2002 |
Received 2002 Kanto Regional Invention Award |
Oct. 2002 |
Received Medium and Small Industry Agency Director Award |
Aug. 2003 |
Certified as "Frontier Company" by Tochigi Pref. |
Oct. 2003 |
Developed Manufacturing Process for Ultra-High Elastic Micro-Probes |
Nov. 2003 |
Developed Manufacturing Process for Ultra-Low Thermal Expansion Vaporization Shadow Masks |
Jul. 2004 |
Developed Ultra-Fine Contact Probe Fabrication Technology |
Jan. 2005 |
Obtained Patent on X-ray Mask |
Apr. 2006 |
Selected One of the "300 Energetics Manufacturing Small-Medium Enterprises" by METI (Ministry of Economy, Trade and Industry of JAPAN) |
May. 2006 |
Registered ISO9001-2000 Certification |
Jan. 2008 |
Developed Mesh-Type Nebulizer Technology and Devices. Started Production of the Devices |
Nov. 2008 |
Completed New Building at Head Factory |
Nov. 2008 |
Developed 2nd Generation Safety Vent (Gas-Release Type) for EDLC, Li-ion Battery |
Jun. 2009 |
Developed New Generation Mask for X-ray Lithography (HARMST2009) |
Aug. 2009 |
Started Co-Study of Measurement System of Mechanical Property with Tohoku Univ. |
Aug. 2009 |
Started Co-Study of Upgrading X-ray Lithography Mask with Ritsumeikan Univ. |
Nov. 2009 |
Started Co-Study of Upgrading LIGA Process with Univ. of Hyogo |
Apr. 2010 |
Obtained Basic Patent on Super Low Thermal Expansion Mask |
Apr. 2010 |
Developed 3rd Generation Safety Vent (Returnable Vent Type) for EDLC, Li-ion Battery |
Jun. 2010 |
Developed Vertical Probe of Φ30µm width |
Nov. 2010 |
Developed and Started Production of Fine Sieve (Stealth Sieve) and Sieving Machine |