History|Ultra-precision manufacturing and processing equipment to Optnics Precision.
History
Company History
| Apr. 1986 | Established OPTNICS PRECISION Co.,Ltd. |
|---|---|
| Mar. 1989 | Developed Magnetic Thin Film Spacer |
| Jan. 1993 | Developed High Tension Mesh |
| Oct. 1994 | Developed Water Repellent Treatment Technique |
| May. 1995 | Set up Department of Technology Planning |
| Jul. 1995 | Developed High Aspect Mesh |
| Feb. 1996 | Developed Fabrication Process for Thickfilm Circuit |
| Mar. 1996 | Completed New Building and transferred Head Factory |
| May. 1996 | Established R&D Center |
| May. 1996 | Developed Diamond Composit Process |
| Jul. 1996 | Certified by Goverment with Innovation Act |
| Oct. 1998 | Micro Mold Set was Approved by NEDO (New Energy Development Organization) |
| Apr. 1999 | Developed X-ray Lithography and X-ray Masks |
| Apr. 1999 | Signed Joint Reseach Agreement with Karls Ruhe Nuclear Institute GmbH |
| Jan. 2000 | Developed Manufacturing Process for Micro-Probe |
| May. 2000 | Obtained Patent on Battery Rupture Disk |
| jan. 2001 | Developed Manufacturing Process for Fuel Injection Nozzle |
| May. 2002 | Received JAPAN Plastic Manufacturing Society Award |
| Jul. 2002 | Developed Vaporization Shadow Mask for Organic EL Display |
| Oct. 2002 | Received 2002 Kanto Regional Invention Award |
| Oct. 2002 | Received Medium and Small Industry Agency Director Award |
| Aug. 2003 | Certified as "Frontier Company" by Tochigi Pref. |
| Oct. 2003 | Developed Manufacturing Process for Ultra-High Elastic Micro-Probes |
| Nov. 2003 | Developed Manufacturing Process for Ultra-Low Thermal Expansion Vaporization Shadow Masks |
| Jul. 2004 | Developed Ultra-Fine Contact Probe Fabrication Technology |
| Jan. 2005 | Obtained Patent on X-ray Mask |
| Apr. 2006 | Selected One of the "300 Energetics Manufacturing Small-Medium Enterprises" by METI (Ministry of Economy, Trade and Industry of JAPAN) |
| May. 2006 | Registered ISO9001-2000 Certification |
| Jan. 2008 | Developed Mesh-Type Nebulizer Technology and Devices. Started Production of the Devices |
| Nov. 2008 | Completed New Building at Head Factory |
| Nov. 2008 | Developed 2nd Generation Safety Vent (Gas-Release Type) for EDLC, Li-ion Battery |
| Jun. 2009 | Developed New Generation Mask for X-ray Lithography (HARMST2009) |
| Aug. 2009 | Started Co-Study of Measurement System of Mechanical Property with Tohoku Univ. |
| Aug. 2009 | Started Co-Study of Upgrading X-ray Lithography Mask with Ritsumeikan Univ. |
| Nov. 2009 | Started Co-Study of Upgrading LIGA Process with Univ. of Hyogo |
| Apr. 2010 | Obtained Basic Patent on Super Low Thermal Expansion Mask |
| Apr. 2010 | Developed 3rd Generation Safety Vent (Returnable Vent Type) for EDLC, Li-ion Battery |
| Jun. 2010 | Developed Vertical Probe of Φ30µm width |
| Nov. 2010 | Developed and Started Production of Fine Sieve (Stealth Sieve) and Sieving Machine |
